Ultra-high Resolution Electron-beam Lithography System
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.
Buyer
ETH Zürich - Abt. Procurement & Export Services
Value
Not provided
Published
2 Oct 2026
Closes
10 Nov 2026
Procurement details
Source
TED (EU)
Country
Switzerland (CH)
Procurement method
Open
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
38000000
Laboratory, optical and precision equipments (excl. glasses)
Lots
Lot LOT-0000 Ultra-high Resolution Electron-beam Lithography System
Value not provided
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of com...
Delivery: Rüschlikon · CH040 · Switzerland
Documents
Unlock document linkTED notice 679334-2026
2 Oct 2026
Tender notice · Web page
Procurement documents
Not provided
Bidding documents restricted
Contains information from TED (Tenders Electronic Daily), © European Union, reused under CC BY 4.0.