Glas and Metal Etch (EMFT-01.2 - EMFT-01.6) - PR1[contact phone hidden]-P
Glas and Metal Etch (EMFT-01.2 - EMFT-01.6)
Buyer
Fraunhofer-Gesellschaft, Einkauf B12
Value
Not provided
Published
17 Jul 2026
Closes
Not provided
Procurement details
Source
TED (EU)
Region
DE212
Procurement method
Selective
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
42990000
Miscellaneous special-purpose machinery
Lots
Lot LOT-0000 Glas and Metal Etch (EMFT-01.2 - EMFT-01.6) - PR1[contact phone hidden]-P
Value not provided
1 Piece Glas and Metal Etch (EMFT-01.2 - EMFT-01.6) Etching equipment for 200 mm substrates. Etching of glass or quartz for interposers or patterned surfacees needs sophisticated process chambers with high plasma densities and etch rate homogeneity. Usually hard masking layers, made from metal or polysilicon, are needed to transfer these pattern into glas or...
Delivery: München · DE212 · Germany
Documents
Unlock document linkTED notice 494658-2026
17 Jul 2026
Award notice · Web page
Contains public sector information licensed under the Open Government Licence v3.0.