Pipeline Noticeocds-r6ebe6-0000785458

Magnetron Sputter Deposition Tool

Argon-based magnetron sputtering system for sequential deposition of metals. The deposition should be made with a direct current method over up to 4” wafer area. The deposition should also be conformal to features present on the wafers. The ideal system will be employed for academic research and located within a cleanroom micro-fabrication facility.

Buyer

University of Strathclyde

Value

£65,000

Published

10 Dec 2024

Closes

10 Dec 2024

Procurement details

Source

Pcs

Region

UKM82

Procurement method

Not provided

Category

Goods

Contract starts

Not provided

Contract ends

Not provided

CPV classifications

38000000

Laboratory, optical and precision equipments (excl. glasses)

Lots

Lot 1 Magnetron Sputter Deposition Tool

Value not provided

The Institute of Photonics is seeking to complement their cleanroom micro-fabrication facility equipment with a metal deposition tool for contacting semiconductor light-emitting devices based on Gallium Nitride, for example but not limited to. The system is primarily destined to be employed for academic research. It is purposed to be a downgrade from existin...

Delivery: UKM82

Magnetron Sputter Deposition Tool

Not provided

Argon-based magnetron sputtering system for sequential deposition of metals. The deposition should be made with a direct current method over up to 4” wafer area. The deposition should also be conformal to features present on the wafers. The...

Planned procurement notice · Web page

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