School of Physics & Astronomy: Inductively Coupled Plasma Reactive-Ion Etching System
The School of Physics & Astronomy is seeking to enhance its research and teaching activity through the acquisition of an Inductively Coupled Plasma Reactive-Ion Etching (ICP-RIE) system.
Buyer
University of St Andrews
Value
Not provided
Published
22 Jan 2021
Closes
24 Feb 2021
Procurement details
Source
Pcs
Region
United Kingdom
Procurement method
Open
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
22520000
Dry-etching equipment
42122450
Vacuum pumps
42124300
Parts of air or vacuum pumps, of air or gas compressors
Lots
Lot 1 School of Physics & Astronomy: Inductively Coupled Plasma Reactive-Ion Etching System
Value not provided
We require an Inductively Coupled Plasma Reactive-Ion Etching (ICP-RIE) system for high quality etching (high etch rates, side wall angle control and low sidewall roughness) of - silicon, - silicon compounds (e.g. SiC, Si3N4), - compound III-V & compound II-VI semiconductors (e.g. AlGaInP, InGaP, AlGaAs, InP, GaAs, GaN, etc.), - dielectrics (e.g. ZnO2, TiO,...
Delivery: UKM72
Documents
Unlock document linkSchool of Physics & Astronomy: Inductively Coupled Plasma Reactive-Ion Etching System
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The School of Physics & Astronomy is seeking to enhance its research and teaching activity through the acquisition of an Inductively Coupled Plasma Reactive-Ion Etching (ICP-RIE) system.
Contract notice · Web page
Portal Supplier Registration
22 Jan 2021
School of Physics & Astronomy: Inductively Coupled Plasma Reactive-Ion Etching System
Not provided
Award notice · Web page
Contains public sector information licensed under the Open Government Licence v3.0.