202122/547 Supply of up to four dry etch and deposition systems
NOTICE OF AWARD OF four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD)
Buyer
UNIVERSITY OF LEEDS
Value
£25,000,000
Published
24 Aug 2023
Closes
16 Mar 2022
Procurement details
Source
Find a Tender
Region
Leeds
Procurement method
Selective
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
22520000
Dry-etching equipment
Lots
Lot 1 202122/547 Supply of up to four dry etch and deposition systems
£25,000,000
NOTICE OF AWARD OF four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD) Additional information: To respond to this opportunity please click here: https://neupc.delta-esourcin...
Delivery: Leeds
Documents
No document metadata is available for this public record.
Contains public sector information licensed under the Open Government Licence v3.0.