School of Physics & Astronomy: Inductively Coupled Plasma Reactive-Ion Etching System
The School of Physics & Astronomy is seeking to enhance its research and teaching activity through the acquisition of an Inductively Coupled Plasma Reactive-Ion Etching (ICP-RIE) system.
Buyer
University of St Andrews
Value
£273,125
Published
1 Jun 2021
Closes
24 Feb 2021
Procurement details
Source
Find a Tender
Region
UKM72
Procurement method
Open
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
22520000
Dry-etching equipment
42122450
Vacuum pumps
42124300
Parts of air or vacuum pumps, of air or gas compressors
Lots
Lot 1 School of Physics & Astronomy: Inductively Coupled Plasma Reactive-Ion Etching System
£273,125
We require an Inductively Coupled Plasma Reactive-Ion Etching (ICP-RIE) system for high quality etching (high etch rates, side wall angle control and low sidewall roughness) of - silicon, - silicon compounds (e.g. SiC, Si3N4), - compound III-V & compound II-VI semiconductors (e.g. AlGaInP, InGaP, AlGaAs, InP, GaAs, GaN, etc.), - dielectrics (e.g. ZnO2, TiO,...
Delivery: UKM72
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