GB-Newcastle: T20/0047

Northumbria university requires an atomic layer deposition (ALD) system for the conformal deposition of ultra-thin films with low pinhole densities for nanometer scale structures and devices. The system should be upgradeable and expandable in nature (e.g. plasma enhanced, additional lines) to allow for multi-disciplinary R&D activities and future range of materials. The ALD system should allow for repeatable and controllable ultra-thin films from recipes and also allow the user to develop their own process/recipes....