Provision of a 200mm Wafer Capable Rapid Thermal Anneal (RTA) Tool

The Zepler Institute Nanofabrication Facility cleanroom has identified a need to procure a RTA (Rapid Thermal Anneal) tool that is capable of processing 200mm wafers under a hydrogen ambient. This tool will support future research in the Nanofabrication Cleanroom Facility and in particular the strategic area of Silicon photonics. The acquisition of this equipment will support the facility's transition towards being fully 200mm wafer capable. The system must be delivered, commissioned and successfully pass user acce...