EBL_Electron Beam Lithography Equipment_2 LOTS

EBL Instrument (Lot1) and Lithography Data Prep System (Lot2) LOT1: The electron beam lithography (EBL) instrument requires both high performance and high reliability. Examples of key research goals include: 1. Patterning novel resists including self-assembled monolayers (SAMs) on glass or semiconductor substrates by direct writing onto the SAM with an electron beam. 2. Writing photonic crystals and optical waveguides on III-V semiconductor heterostructures such as GaAs/AlGaAs. 3. Writing leads onto 2D materials su...