Plasma-Enhanced Chemical Vapour Deposition (PECVD) System
We want to acquire a Plasma-Enhanced Chemical Vapour Deposition (PECVD) system. Your proposed System should be able to deposit thin films of silicon oxide, silicon nitride, combinations of both (silicon oxynitride) and also amorphous silicon. Your proposed System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. Your proposed System should integrate smoothly with the existing facilities without any prejudice for the normal operation of the space. We envisage two...
Buyer
University of Bristol
Value
£180,000
Published
23 Dec 2016
Closes
30 Jan 2017
Procurement details
Source
Contracts Finder
Region
United Kingdom
Procurement method
Open
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
38000000
Laboratory, optical and precision equipments (excl. glasses)
Lots
Lot default Plasma-Enhanced Chemical Vapour Deposition (PECVD) System
£180,000
We want to acquire a Plasma-Enhanced Chemical Vapour Deposition (PECVD) system. Your proposed System should be able to deposit thin films of silicon oxide, silicon nitride, combinations of both (silicon oxynitride) and also amorphous silicon. Your proposed System will be located in a class 10000 cleanroom space and will be operated by students and technical...
Delivery: South West · United Kingdom, South West, United Kingdom
Documents
Unlock document linkOpportunity notice on Contracts Finder
23 Dec 2016
Opportunity notice on Contracts Finder
Tender notice · Web page
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