Pulsed UV laser

The University of Sheffield is out to tender on behalf of the Department of Electronic and Electrical Engineering for components which seek to perform in-situ laser lithography inside a semiconductor reactor. This tender is for a pulsed UV visible laser system to perform the interference lithography. The primary wavelength should be between 300 and 400nm, the pulse width in the 0.5-10ns regime, the pulse energy a minimum of 200mJ and the pulse frequency in the 10 to 25Hz range. Beam quality, stability and divergenc...