Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) System
We want to acquire an Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) system. The system should be able to etch the surface of samples utilising RIE physical-chemical mechanism. The System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. The System should integrate smoothly with the existing facilities without any prejudice for the normal operation. The main purpose for the System is the definition of silicon and silicon-related waveguide structures...
Buyer
University of Bristol
Value
£350,000
Published
23 Dec 2016
Closes
30 Jan 2017
Procurement details
Source
Contracts Finder
Region
United Kingdom
Procurement method
Open
Category
Goods
Contract starts
Not provided
Contract ends
Not provided
CPV classifications
38000000
Laboratory, optical and precision equipments (excl. glasses)
Lots
Lot default Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) System
£350,000
We want to acquire an Inductively-Coupled Plasma Reactively Ion Etching (ICP-RIE) system. The system should be able to etch the surface of samples utilising RIE physical-chemical mechanism. The System will be located in a class 10000 cleanroom space and will be operated by students and technical staff. The System should integrate smoothly with the existing f...
Delivery: South West · United Kingdom, South West, United Kingdom
Documents
Unlock document linkOpportunity notice on Contracts Finder
23 Dec 2016
Opportunity notice on Contracts Finder
Tender notice · Web page
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